Recently, industry insiders pointed out that the purely domestic 14nm process will be mass-produced by the end of next year at the earliest. This is undoubtedly a huge improvement from the previously promoted 28nm process to achieve pure domestic production. The rapid progress of domestic advanced technology will help promote the domestic chip industry. leap forward.
The people of the country are excited, the purely domestic 14nm will be realized by the end of next year, ASML may really regret it
Wen Xiaojun, director of the Institute of Electronic Information, was the first to report the localization of 14nm. In an interview in June this year, he said that domestic 14nm chips would be mass-produced by the end of next year. What about the efforts to realize the localization of 28nm and leap forward to 14nm?
This starts with the characteristics of the lithography machine. People in the industry point out that there are no 28nm and 14nm lithography machines in the strict sense. Since the 45nm process, immersion lithography machines have been used, and the light source is DUV light source ArF, laser The wavelength of the light source is 193nm, and then the wavelength is further shortened by the refraction of the water medium, so that the wavelength of the light source can be shortened to 132nm to 12nm, so that the 45nm to 28nm process can be produced.
Later, the chip manufacturing process introduced FinFET technology, so that the DUV lithography machine with the same 193nm light source can produce chips with a 14nm-10nm process, and even TSMC’s first-generation 7nm process was developed with DUV lithography machines and FinFET technology. . SMIC has produced a 14nm process with ASML’s DUV lithography machine, which means that domestic chip manufacturers have mastered FinFET technology.
At present, the domestic lithography machine has achieved 40nm. The key is how to further shorten the 193nm light source through the water medium by technical means, and use the 193nm light source to produce 28nm and 14nm light sources after refraction through the water medium. The principle should be Similarly, some people in the industry recently reported that the domestic light source technology has successfully made a breakthrough, shortening the light source to 13.5nm, so it is reasonable to develop a domestic lithography machine for the production of 14nm process.
The people of the country are excited, the purely domestic 14nm will be realized by the end of next year, ASML may really regret it
The production of an advanced process is actually not just a lithography machine, but many links and equipment. Industry insiders have concluded that there are about eight major links. Previously, the domestic chip manufacturing industry chain has successively solved problems other than lithography machines through point breakthroughs. Other links and equipment have advanced to 14nm and more advanced processes.
Among them, the well-known etching machine is the fastest-growing among domestic chip manufacturing equipment. At present, the domestic etching machine has broken through to the 5nm process, which also shows that the domestic technology research and development strength is quite strong. It has sufficient technical strength to develop advanced chip manufacturing equipment.
It’s just that the lithography machine is the most complicated type of equipment, involving laser light sources, lenses, machines, etc. The lithography machine alone is actually a rather complicated industrial chain. ASML’s lithography machines also require Germany, Japan and Japan. Many manufacturers in the United States can only produce related accessories. Domestic lithography machines have made breakthroughs in machine tables and light sources before. The key technology should be how to further shorten the 193nm light source through technical processing. Now this one The problem has been solved, and it is reasonable to solve the localization of 28nm and 14nm lithography machines at the same time.
ASML suddenly shipped DUV lithography machines to China in the first quarter of this year. The reason may be that it learned of China’s sudden progress in lithography machine technology and hoped to make another profit before mass production of 14nm DUV lithography machines in China; The United States suddenly asked ASML to stop selling lithography machines below 14nm to China, which may be related to this, because China is about to solve the lithography machines of the 14nm process, and it is meaningless to restrict lithography machines above 14nm.
The people of the country are excited, the purely domestic 14nm will be realized by the end of next year, ASML may really regret it
The strength of the Chinese in technology research and development is well known. Even many technology research and development talents in the United States are of Chinese descent. It can also be seen that the Chinese people are talented in technology research and development. The American approach has inspired Chinese technical talents to forge ahead. A leap in chip manufacturing has been achieved in a few years, which is obviously beyond the expectations of the United States. Facts have shown that restrictions will not help the development of global science and technology.